Tungsten (W), with the highest melting point of all metals (3,422 °C), stands as a critical strategic resource in the modern industrial landscape. As a premier China W Powder Manufacturer, we recognize that the quality of Tungsten powder directly dictates the performance of downstream applications, from microelectronics to heavy-duty tooling and aerospace shielding. The transition towards sub-5nm semiconductor nodes and the increasing demand for high-temperature refractory alloys have pushed the technical requirements for W powder to unprecedented levels.
Controlled oxygen levels and trace metallic impurities to ensure ultra-stable thin-film deposition during sputtering processes.
Advanced hydrogen reduction techniques allow us to produce powders with spherical morphology and narrow particle size distribution.
Seamless integration with Titanium (WTi), Silicon (WSi), and Chromium to create high-density sputtering targets.
Years of Industry Experience
Core Technology Patents
Senior Technical Professionals
Global Satisfied Customers
The global supply chain for Tungsten is evolving. International buyers from the EU, North America, and Southeast Asia are no longer just looking for "low cost." They are seeking "Reliability and Information Gain." As a Tungsten Powder Factory, we address the three pillars of global procurement:
In semiconductor fabrication, a variance of 0.1% in purity can lead to catastrophic yield loss. Our production flow integrates CMM size testing and powder performance diagnostics at every stage.
With massive reserves and integrated smelting-to-processing capabilities in China, we offer a stable buffer against global market volatility and logistics disruptions.
Modern procurement requires conflict-free mineral certification and RoHS/REACH compliance. We provide full record traceability from raw materials to final delivered products.
The future of W Powder manufacturing lies in the intersection of nanotechnology and plasma metallurgy. Our R&D center is currently focusing on three primary technical routes:
Developing ultra-fine W powder (<100nm) to improve the sintering density of targets to >99.9% theoretical density.
Utilizing Radio Frequency (RF) plasma to produce perfectly spherical powder for 3D printing (Additive Manufacturing) of refractory parts.
Proprietary chemical-vapor treatments to reduce surface oxygen content to below 100ppm, essential for ultra-high vacuum applications.
Strict control of purity, particle size, and chemical composition stability.
Monitoring slurry concentration and composition uniformity for optimal flowability.
Automated presses ensure high blank strength and consistency across batches.
Utilizing Hot Pressing (HP), Pressureless Sintering, and Reaction Sintering methods.
Subsequent stages include Precision Machining with imported high-precision equipment, Rigorous Testing (CMM and Ceramic performance), and Semiconductor-grade Cleaning in dust-free workshops before logistics and shipment.
Shanghai Creative Advanced Materials Co., Ltd is more than a manufacturer; we are a global partner. We provide:
Customized material solutions based on your specific PVD equipment parameters and film requirements.
Partnered with major global freight forwarders to ensure DDP/CIF/FOB efficiency with full export qualifications.
ISO 9001:2015 certified quality management systems and environmental protection protocols.
A: We offer multiple grades, ranging from industrial 99.9% (3N) to high-purity semiconductor grades of 99.999% (5N) and above, with strictly controlled gaseous impurities.
A: Yes, our spray granulation and air classification systems allow us to tailor PSD (Particle Size Distribution) to meet specific flowability and coating density requirements.
A: We use high-energy ball milling and vacuum hot-pressing sintering to ensure a perfectly homogeneous phase distribution and high relative density (>99%).
A: Standard powder products typically ship within 2-3 weeks, while custom-machined targets or alloy powders require 4-6 weeks depending on complexity.
Established in the Shanghai Industrial Comprehensive Development Zone, we are a high-tech enterprise at the forefront of the materials revolution. Our expertise spans across semiconductor ceramic targets, powder metallurgy targets, and neutron absorption materials. With a focus on R&D, we bridge the gap between laboratory innovation and industrial-scale production. Our Commitment to "Top Quality, Fast Delivery, and Professional Design" makes us the preferred partner for leading global brands in the semiconductor, LED, and solar energy sectors.
