Wholesale High-Purity 300mm Cr Target for Precision Applications Supplier, Factory

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Wholesale High-Purity 300mm Cr Target for Precision Applications Supplier, Factory

Chromium targets have the same properties as chromium metal (Cr). Chromium target is a steel-gray, shiny, hard, and brittle transition metal. In a vacuum, chromium targets can produce relatively stable chromium ion beams, which allows them to be used to make substrates or surface coatings to protect substrates or to make industrial parts that require high oxidation resistance. Chromium targets can also be used to prepare stoichiometric studies of chromium compounds.

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Product Description

Characteristics

Film Properties

Strong adhesion The chromium film has a strong bond with glass, metal, and polymer substrates, making it an ideal adhesion layer material.
Hardness and wear resistance The film hardness can reach 800-1000 HV, which significantly improves the scratch resistance of the device surface.
Corrosion resistance Stable in humid, salt spray and acidic environments, widely used in protective coatings.

Efficient Sputtering

High sputtering rate High density (≥ 7.2 g/cm³) and low oxygen content (≤ 500 ppm) improve the deposition efficiency.
Uniform and dense film formation The grain size is small (≤ 30 μm), and the film thickness variation is ≤ 5%, which is suitable for coating large substrates.
Low particle defects Ultra-high purity (≥ 99.95%) reduces particulate contamination during sputtering.

Chemical Compatibility

Oxidation resistance Forms a dense Cr₂O₃ passivation layer in the air to protect the underlying material.
Low-temperature deposition Can form a film at a low temperature of ≤ 150 °C, compatible with heat-sensitive substrates such as plastics.
Excellent etching characteristics High selectivity with photoresist etching, simple graphic process.

Frequently Asked Questions

What are the primary film properties of the chromium coating?

The chromium film features strong adhesion with glass, metal, and polymer substrates. It delivers a high hardness of 800-1000 HV for scratch resistance and remains stable in humid, salt spray, and acidic environments.

How does this material achieve a high sputtering rate?

High sputtering rate and deposition efficiency are achieved through high density (≥ 7.2 g/cm³) and low oxygen content (≤ 500 ppm).

What makes the chromium film suitable for large substrates?

The film is highly uniform and dense due to a small grain size (≤ 30 μm) and low film thickness variation of ≤ 5%, ensuring even distribution across large surfaces.

How are particle defects minimized during the sputtering process?

The chromium material features an ultra-high purity of ≥ 99.95%, which significantly reduces particulate contamination and defects during sputtering.

Is the deposition process compatible with heat-sensitive substrates?

Yes, it has a low-temperature deposition capacity that allows film formation at temperatures ≤ 150 °C, making it compatible with heat-sensitive substrates like plastics.