CrSi alloy target materials are high-purity alloy sputtering targets formed by a precise ratio of chromium (Cr) and silicon (Si) (with silicon content typically ranging between 10–50 at%), specifically designed for physical vapor deposition (PVD) processes such as magnetron sputtering. Their unique composite characteristics of semiconductor and metal impart them with critical application value in fields such as semiconductor integrated circuits, functional film sensors, and high-temperature protective coatings.
