Precision-manufactured utilizing state-of-the-art powder metallurgy processes. Designed for high thermal conductivity, exceptional density, and minimal micro-arcing.
Serbia is rapidly transitioning from a traditional heavy manufacturing and smelting base into a highly sophisticated Eastern European hub for automotive components, precision machinery, and smart electronics. Supported by key industrial zones in Smederevo, Kragujevac, Niš, and Novi Sad, local manufacturers are progressively upgrading their physical vapor deposition (PVD) processes to secure longer lifespans for cutting tools, engine parts, and sensor matrices.
This transformation requires highly specialized, ultra-dense sputtering materials. Traditional suppliers often present long lead times or high structural variability. Shanghai Creative Advanced Materials Co., Ltd. fills this gap by delivering vacuum-sintered and hot-isostatically pressed (HIP) powder metallurgy targets directly to Serbian processing plants. Our components optimize film homogeneity and stability, aligning with EU automotive quality standards.
Modern sputtering deposition systems require targets with minimal structural defects and maximum relative density. As magnetron sputtering systems transition to high-power impulse magnetron sputtering (HiPIMS) to improve ionization rates, traditional cast targets often fail under thermal stress. The powder metallurgy route provides an indispensable alternative:
By using fine-grained, atomized metal powders, our targets exhibit uniform, isotropic grain orientations, ensuring consistent sputtering rates across the entire target life cycle.
We eliminate interstitial impurities (Oxygen, Nitrogen, Hydrogen) using advanced vacuum degasification, ensuring high-fidelity electronic and mechanical film performance.
Near-theoretical densities achieved via Hot Isostatic Pressing (HIP) and vacuum hot pressing reduce micro-voids, virtually eliminating micro-arcing and subsequent particulate defects on substrates.
Shanghai Creative Advanced Materials Co., Ltd. (SCA) operates a highly digitized fabrication facility integrating smart sintering controls, robotic powder blending, and automated quality testing. Our manufacturing system ensures that from raw metal refinement to the final target assembly (backing plate bonding), every batch is fully traceable.
Different engineering components demand specific metallurgical coatings to survive challenging environments. Our targets are optimized for diverse industrial applications in Serbia:
For cutting tools, mold components, and automotive stamp dies, we provide Chromium (Cr), Boron Carbide (B4C), and Titanium-Aluminum (TiAl) targets. Sputtered layers using these materials create excellent barrier properties, boasting extremely high micro-hardness (>30 GPa) and oxidation resistance at high operational temperatures.
The microelectronics and sensor manufacturing sector in Niš relies on ultra-pure Tungsten-Titanium (WTi), Pure Tungsten (W), and Tungsten Silicide (WSi) targets. These materials are sputtered to form diffusion barriers, electrical interconnects, and adhesive layers in high-density integrated circuits and micro-electromechanical systems (MEMS).
Sputtered films for modern touch panels, smart windows, and environmental sensors require high transparency and electrical conductivity. Our Zinc Oxide (ZnO) and Magnesium Zinc Oxide (MgZnO) ceramic targets provide uniform deposition, enabling precise control over bandgap energy and carrier concentration.
Beyond traditional PVD targets, we provide Boron Nitride (BN) sintered plates, crucibles, and Silicon Carbide (SiC) wear parts. These materials are engineered to withstand extreme temperatures, thermal shock, and chemical attacks in glass shaping, metal casting, and advanced industrial furnaces.
Every sputtering target manufactured at our factory undergoes rigorous processing and validation checks to guarantee long-term stability and high deposition rates.
ICP-OES and GDMS testing verify purity, particle size, and chemical stability of base powders.
Slurry homogenization and spray drying generate uniform, flowable powder spheres.
Isostatic pressing yields uniform green-body densities, minimizing directional shrinkage.
Options include hot pressing, pressureless sintering, and HIP to maximize relative density.
Precision multi-axis diamond grinding finishes targets to within +/-0.1mm dimensional tolerance.
Ultrasonic non-destructive testing (NDT) checks for internal voids, cracks, or bonding flaws.
Strict semiconductor-grade cleanroom cleaning followed by double vacuum packaging.
Export-qualified protective packing prevents oxidation and mechanical shock during transit.
Explore our diverse portfolio of high-performance alloy targets, ceramic targets, and refractory composites. Custom sizes and backing plate bonding services are available upon request.
Understand the metallurgical innovations that set Shanghai Creative Advanced Materials apart from conventional target manufacturers.
By applying simultaneous isostatic pressure and high temperature in an inert environment, we eliminate internal microporosities. This is critical for Chromium and Molybdenum alloy targets, where micro-voids cause localized electrical discharge and macro-defect generation during deposition.
SPS uses pulsed direct currents to achieve rapid heating rates under uniaxial pressure. This technique minimizes sintering time, effectively suppressing grain growth. The resulting target possesses a highly refined grain size, yielding isotropic thin-film distributions.
To prevent target cracking caused by high heat loads, we bond target plates to Oxygen-Free High Conductivity (OFHC) copper backing plates. Our void-free indium bonding line achieves a bonding ratio of >98% verified by ultrasonic testing, ensuring efficient cooling during sputtering.
