In the rapidly evolving landscape of thin-film deposition, High Purity Chromium (Cr) Sputtering Targets serve as the backbone for critical applications ranging from semiconductor gate electrodes to decorative hard coatings. As a leading **China High Purity Chromium Target Factory**, we recognize that "purity" is not just a number—it is a performance metric that determines the electrical conductivity, optical reflectivity, and corrosion resistance of the final sputtered film.
The industry is currently transitioning from 3N (99.9%) and 4N (99.99%) to ultra-high 5N (99.999%) purity levels. Our technical roadmap focuses on three pillars: Grain Size Homogeneity, Crystalline Orientation, and Gas Impurity Control (O, N, H).
By implementing advanced vacuum induction melting (VIM) and hot isostatic pressing (HIP), we achieve grain sizes under 100μm, ensuring uniform erosion rates and reduced particle generation during sputtering.
Our proprietary refining process reduces oxygen content to below 100ppm, critical for the production of Low-E glass and high-end semiconductor chips where oxidation can compromise circuit integrity.
Developing monolithic rotatable Cr targets up to 4 meters in length to support the next generation of G10.5 display panel production lines.
Operating as a modern **High Purity Chromium Target Factory** in Shanghai, we have integrated AI-driven quality control systems. From the moment raw electrolytic chromium flakes enter our facility, every step is logged in a digital twin system. This ensures 100% traceability—a non-negotiable requirement for aerospace and medical grade applications.
The unparalleled commitment on quality orientation, continuous improvement, customer satisfaction and quality, which enables SCA to be the excellent partner of Ceramics development business. SCA Provides full record traceability from raw materials to final products.
With the excellent performance, reliable quality, and fast delivery, our products are widely recognized and trusted. We understand that saving time is very important for our customers, ensuring orders are delivered quickly and accurately.
We customize advanced solutions with unique properties of advanced ceramic materials to meet the most demanding applications. Shanghai Creative Advanced Materials Co., Ltd is based on a wide range of material combinations.
Established in Shanghai Industrial Comprehensive Development Zone, we are a high-tech company that integrates the research and development, production, and sales of semiconductor ceramic targets, powder metallurgy targets, and ceramic components. Our focus includes neutron absorption materials and high-performance polymer products.
Purity, particle size, and chemical stability control for foundation quality.
Monitoring slurry concentration and composition uniformity.
Automated pressing for superior blank strength and consistency.
Hot pressing, pressureless, and isostatic pressing methods.
Imported high-precision equipment for dimensional accuracy.
CMM size testing, ceramic performance, and powder analysis.
Dust-free workshops and semiconductor cleaning lines.
Global export qualifications and reliable logistics partners.
We don't just supply materials; we provide Macro Industry Solutions. For the Semiconductor industry, we provide high-purity Cr targets for barrier layers. For the Solar Energy sector, our Cr targets optimize the back contact of CIGS thin-film cells. For Automotive & Hardware, we offer CrAl and CrTi alloy solutions that provide diamond-like hardness (DLC) coatings.
Local technical support in Europe, North America, and Southeast Asia ensures 24-hour response times for troubleshooting and optimization.
Adhering to ISO 9001, ISO 14001, and REACH regulations. Our "Conflict-Free Minerals" policy ensures ethical sourcing of all chromium raw materials.
Tailored stocking programs and "Just-In-Time" delivery models for global enterprises to minimize inventory holding costs.
