China CrSi Target Manufacturer & Factory

Global Leaders in High-Purity Chromium Silicon Sputtering Targets & Advanced Powder Metallurgy Solutions

The Evolution of CrSi Targets in Global Semiconductor Manufacturing

Chromium-Silicon (CrSi) sputtering targets represent the pinnacle of thin-film resistor technology. As a leading China CrSi target manufacturer, we recognize that the semiconductor industry is shifting towards sub-5nm nodes, where the demand for precise Temperature Coefficient of Resistance (TCR) and high stability is non-negotiable. CrSi alloys, particularly in ratios like 20/80 and 30/70, are essential for integrated circuits (ICs), micro-electronics, and precision instrumentation.

In the current industrial landscape, CrSi targets are not merely materials; they are the foundation of high-performance thin-film resistors. These resistors must withstand extreme environmental conditions while maintaining a stable resistance value. Our factory utilizes vacuum induction melting (VIM) and advanced powder metallurgy to ensure that every CrSi target reaches a purity level of 99.95% or higher, with uniform grain sizes that eliminate "arc" issues during the sputtering process.

19+

Years Experience

100+

Core Technologies

200+

Engineers

5000+

Global Clients

Global Sourcing & Supply Chain Resilience

Strategic Sourcing Needs

Global procurement teams are moving away from single-source dependencies. As a premier CrSi target factory, we provide the resilience needed in the modern "China Plus One" strategy, offering world-class quality at competitive price points.

Localized Application Scenarios

From the medical imaging centers in Europe to the automotive sensors in Southeast Asia, our CrSi targets are optimized for localized sputtering environments, ensuring compatibility with all major PVD systems like Endura, Centura, and various custom magnetron setups.

Material Optimization

We provide "Information Gain" to our clients by sharing data on how Cr-Si phase distribution affects film resistivity. This helps engineers optimize their deposition rates and post-annealing processes for better yield.

Shanghai Creative Advanced Materials: Factory 4.0

Shanghai Creative Advanced Materials Co., Ltd, established in Shanghai Industrial Comprehensive Development Zone, is a high-tech company that integrates the research and development, production, and sales of semiconductor ceramic targets, powder metallurgy targets, and ceramic components.

Our China Factory 4.0 initiatives focus on digital traceability. Every CrSi target we produce is assigned a unique serial number, linking it to its raw material batch, sintering parameters, and final purity analysis. This level of transparency is why we are trusted by the world's most demanding semiconductor fabs.

Core Material Expertise

Boron Carbide (B4C)

Hardness second only to diamond. Used in individual soldier protection, tank armor, and neutron absorption in nuclear industries.

Silicon Carbide (SiC)

A synthetic crystalline compound for precision ceramic components in semiconductor, solar energy, and LED fields.

Boron Nitride (BN)

Chemical corrosion resistance, used for high-temperature insulation, heat dissipation, and nozzles for aircraft engines.

Our Precision Manufacturing Process

01. Raw Materials

Strict control of purity, particle size, and chemical stability.

02. Spray Granulation

Monitoring slurry concentration and particle distribution.

03. Cold Pressing

Automated pressing for better blank strength and consistency.

04. Sintering

Hot pressing, pressureless, and reaction sintering methods.

05. Machining

Imported high-precision equipment for extreme accuracy.

06. Testing

CMM size testing, ceramic performance, and powder analysis.

07. Cleaning

Semiconductor-grade cleaning in dust-free workshops.

08. Logistics

Certified export qualifications and reliable global partners.

Frequently Asked Questions (FAQ)

What are the typical purity levels for your CrSi targets?+
We typically provide purity levels of 99.95% to 99.99%. For specialized semiconductor applications, we can achieve even higher ultra-high purity (UHP) standards.
Do you support custom Cr-Si ratios?+
Yes, while 20/80 and 30/70 (wt%) are the most common, our powder metallurgy facility can produce custom compositions tailored to your specific resistivity requirements.
How do you ensure grain size uniformity?+
Through our proprietary hot pressing sintering process, we maintain sub-micron grain sizes, which ensures stable sputter yield and reduces particle generation during deposition.
What is your lead time for international orders?+
Standard sizes are usually shipped within 2-4 weeks. Custom geometries or compositions may take 6-8 weeks depending on the complexity.