High-purity advanced materials for global industrial research and manufacturing.
In the rapidly evolving landscape of thin-film technology, Molybdenum Silicide (MoSi) targets have emerged as a critical material for advanced semiconductor nodes and high-performance electronic devices. As a leading wholesale MoSi target manufacturer, Shanghai Creative Advanced Materials Co., Ltd. (SCA) combines decades of metallurgical expertise with state-of-the-art sintering technologies to provide targets that exceed the rigorous standards of the VLSI (Very Large Scale Integration) industry.
Why MoSi is the Industry StandardMoSi targets, primarily available in phases like MoSi₂ and Mo₅Si₃, offer a unique combination of metallic conductivity and ceramic oxidation resistance. These properties are indispensable for the creation of silicide gates, interconnects, and diffusion barriers. Our manufacturing process ensures a high-density, fine-grained microstructure, which is essential for reducing "particle splash" during the sputtering process—a key factor in increasing wafer yield.
The Advantage of China-Based ManufacturingChina has become the global hub for advanced material processing, and SCA stands at the forefront of this industrial revolution. Our China-based factory leverages integrated supply chains to source ultra-high purity Molybdenum and Silicon powders. By maintaining local control over the entire production cycle—from Spray Granulation to Hot Isostatic Pressing (HIP)—we offer a 30-40% cost advantage compared to Western suppliers without compromising on E-E-A-T (Experience, Expertise, Authoritativeness, and Trustworthiness) standards.
MoSi targets are shaping the next generation of technological breakthroughs.
As nodes shrink to 3nm and below, MoSi targets provide the thermal stability required for advanced gate-last processes and ohmic contacts.
In TOPCon and HJT solar cells, Molybdenum silicide layers act as efficient conductive oxides, enhancing electron transport and overall cell efficiency.
Beyond electronics, MoSi2 is used for aerospace turbine blades and heating elements due to its ability to form a protective SiO₂ "glass" layer at 1500°C.
For global procurement managers, the challenge is not just finding a MoSi target supplier, but finding a strategic partner. SCA provides Macro Industry Solutions that include:
MoSi targets are often doped with trace elements to tune the work function in MOS devices. SCA offers specialized vacuum induction melting for these niche requirements.
Ensuring every MoSi target meets the zero-defect standard of the semiconductor industry.
Strict control of purity, particle size, and chemical stability.
Monitoring particle size distribution and loose tap density.
Automated forming for superior blank strength and consistency.
High-pressure sintering to achieve near-theoretical density.
Answering the most critical questions from engineers and procurement teams.
MoSi2 (Molybdenum Disilicide) is the most common phase for high-temperature applications and standard gate electrodes. Mo5Si3 is often used when a different Si-to-Mo ratio is needed for specific work function tuning or when higher Silicon content is required to prevent diffusion in complex film stacks.
MoSi is inherently brittle. We utilize a high-quality bonding process using Indium (In) or specialized alloys to attach the target to a Copper backing plate. This provides the necessary thermal dissipation and mechanical support to prevent thermal stress cracking at high power densities.
For standard R&D, 3N5 (99.95%) is acceptable. For industrial semiconductor production, we provide 4N (99.99%) or even 4N5 (99.995%) purity, where transition metal impurities like Fe, Ni, and Cr are kept below 10ppm each.
Yes. As an ISO 9001 certified manufacturer, every target batch undergoes ICP-MS (Inductively Coupled Plasma Mass Spectrometry) and GDMS (Glow Discharge Mass Spectrometry) testing. A full COA including purity and density measurements is included with every delivery.
Through our proprietary spray granulation and HIP sintering process, we maintain an average grain size of <100 microns. Finer grains lead to more uniform sputtering and a significant reduction in target-generated particles on the wafer.
Yes, sustainability is key. We offer a closed-loop recycling service for our global clients, where spent targets and backing plates can be returned for refinement, reducing environmental impact and long-term procurement costs.
Expand your research and production with our full suite of high-performance materials.
Established in the Shanghai Industrial Comprehensive Development Zone, we are a high-tech pioneer specializing in semiconductor ceramic targets, powder metallurgy targets, and advanced ceramic components. With 19 years of experience, our mission is to integrate R&D, production, and sales to provide the global market with the next generation of neutron absorption and thin-film materials.
Full record traceability from raw materials to final products with patented serial numbering.
Customized advanced solutions leveraging unique properties of advanced ceramics.
Stay updated with the latest sintering technologies and material science breakthroughs.
2026-07-02
Localized sintering technologies drive upgraded zirconia ceramic industry in China.
2026-06-03
Exploring the benefits of hot isostatic pressing in target density.
2026-05-22
A technical review on achieving high-performance ceramics without external pressure.
