Explore our range of precision-manufactured targets, slugs, and components engineered for optical coatings, semiconductors, and functional industrial designs.
Iron Cobalt Tantalum alloy (FeCoTa) sputtering targets are the cornerstone materials for the fabrication of soft magnetic underlayers (SUL) and advanced magnetic recordings. By incorporating precise trace amounts of Tantalum into the Iron-Cobalt binary matrix, the alloy forms an amorphous structural phase that dramatically minimizes grain-boundary noise while ensuring optimal magnetic permeability, low coercivity, and high saturation magnetization.
At Shanghai Creative Advanced Materials Co., Ltd., we utilize advanced powder metallurgy and vacuum melting processes to eliminate localized segregation. Our FeCoTa targets feature a homogeneous distribution, ultra-low gas content (O, N, H < 100ppm), and exceptional density exceeding 98% of the theoretical limit. This level of quality guarantees structural stability during RF, DC, or magnetron sputtering processes.
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Why Tier-1 semiconductor developers and global corporations trust our vertically integrated manufacturing ecosystem.
By securing primary high-purity Fe, Co, and Ta metal powders locally within China, we protect customers from international market volatility, offering stable pricing and reliable delivery lead times.
Our facility features state-of-the-art Hot Isostatic Pressing (HIP) and Vacuum Induction Melting (VIM) systems. These technologies prevent elemental segregation in multi-component thin-film applications.
Every target undergoes strict inspection, including GDMS purity analysis and ultrasonic non-destructive testing (NDT), to guarantee zero bonding voids and stable sputtering performance.
Shanghai Creative Advanced Materials Co., Ltd. (SCA), situated in the Shanghai Industrial Comprehensive Development Zone, is a high-tech pioneer integrating R&D, production, and sales of high-purity sputtering targets, advanced structural ceramics, and powder metallurgy products.
Over nearly two decades, we have partnered with domestic and international semiconductor fabs, data storage giants, and scientific research institutes. We offer customized product series tailored to meet demanding deposition parameters.
Delivering high-quality performance through strict design and material refinement.
We provide complete trace history from raw powders to finished targets. Serialized tracking guarantees consistent quality, batch after batch.
With optimized manufacturing paths and inventory programs, we minimize production delays and ship quickly worldwide.
We engineer targets customized to your specific geometry, backing plate configurations, and multi-component compositions.
SCA offers end-to-end support, including technical consulting, target bonding service, and spent-target recycling programs.
We supply high-performance ceramic materials and functional targets tailored for industrial applications.
One of the hardest synthesized materials. Essential for personal armor, nuclear neutron-absorption shielding, and semiconductor grinding media.
Offers high hardness, thermal shock resistance, and corrosion resistance. Widely used for precision processing components in the LED and semiconductor sectors.
Excellent electrical insulation and wear resistance, suited for high-temperature structural designs and thin-film passivation processes.
Combines high thermal conductivity and corrosion resistance. Often applied as electrical insulation panels and evaporation crucibles.
A step-by-step overview of our quality assurance pipeline, ensuring consistent high-purity sputtering performance.
We verify trace element purity, grain-size distribution, and chemical stability from the start.
Ensures uniform slurry distribution, preventing localized variances in multi-component targets.
Automated hydraulic compression creates uniform density in green bodies.
Vacuum hot-pressing and pressureless sintering options yield high densities.
Precision CNC tooling shapes targets to exact dimensions with tight tolerances.
CMM measurements, ultrasonic bond line testing, and GDMS analyze impurity limits.
Cleanroom chemical washing removes handling residue and surface contaminants.
Vacuum-sealed packaging protects targets from humidity and oxidation during transit.
Modern semiconductor and recording thin-film processes require high yield rates. Sputtering targets must exhibit uniform composition and high density to reduce particulate ejection (nodule formation) during operation. Our customized backing plates and indium bonding services meet the mechanical standards of major industry sputtering systems.
We operate in compliance with ISO 9001 and ISO 14001, providing RoHS, REACH, and full conflict-free mineral trace certifications. Our logistics team handles international export clearances and custom duty packaging, helping clients maintain secure supply chains.
As magnetic storage density reaches physical limits, HAMR (Heat-Assisted Magnetic Recording) systems demand complex FeCoTa, FePt-based, and co-sputtered ceramic-dopant targets. We continue to invest in microstructural refinement to support these next-generation thin-film designs.
Where our advanced materials play critical roles in high-tech manufacturing.
Used in magnetic thin-film heads and soft magnetic underlayers (SUL) to guide magnetic flux writing, enabling high recording densities.
Provides high spin polarization and magnetic anisotropy, key to layering magnetic tunnel junctions (MTJ) in memory devices.
Sputtered thin films shield sensitive electronic components from EMI, especially in compact high-frequency devices.
Common technical inquiries regarding procurement, target composition, and processing parameters.
Stay updated with technological developments in advanced sputtering materials and semiconductor ceramics.
Localized sintering technologies drive upgraded zirconia ceramic industry in China.
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Expanding sintering limits to achieve denser target compounds for electronic applications.
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Analysis of structural uniformity benefits in high-temperature silicon carbide components.
Read Industry NewsComplete product catalog containing high-purity metallic alloy targets and industrial compound components.
