China Cr Sputtering Target Supplier & Factories

Advanced Metallurgical Solutions & High-Purity Chromium Sputtering Targets for Global Semiconductor, Display, and Coating Industries.

The Strategic Importance of Chromium (Cr) Sputtering Targets in Modern PVD

Chromium (Cr) sputtering targets are cornerstones of the Physical Vapor Deposition (PVD) industry. As a key material for creating ultra-thin films, their application spans from decorative coatings on automotive trims to critical barrier layers in semiconductor manufacturing. A high-quality Cr Sputtering Target from a leading China supplier must exhibit exceptional purity, uniform grain size, and high density to ensure the stability of the sputtering process and the longevity of the final product.

In the current global manufacturing landscape, the demand for precision and reliability has driven significant innovation in Chromium target fabrication. Shanghai Creative Advanced Materials Co., Ltd. (SCA) stands at the forefront of this evolution, leveraging 19 years of expertise to provide targets that exceed international standards for oxygen content, electrical conductivity, and thermal stability.

💡 99.995% Purity

Ultra-low impurity levels ensure zero contamination in sensitive semiconductor and optoelectronic processes.

🔬 Fine Grain Size

Optimized microstructure with grain sizes <100μm for uniform erosion rates and reduced particle generation.

⚙️ High Density

Near-theoretical density (>99%) prevents arching and ensures consistent sputtering power throughout the target's life.

Why China Factories Excel in Cr Sputtering Target Production

The rise of China as a dominant force in advanced materials is not merely a matter of cost, but of systemic integration and technological maturity. Chinese factories, particularly those located in industrial hubs like Shanghai, offer unique advantages that are reshaping the global supply chain.

1
Integrated Supply Chain: Access to primary Chromium raw materials and proximity to downstream semiconductor and solar industries reduces logistics costs and lead times.
2
Advanced Metallurgy: Implementation of VIM (Vacuum Induction Melting) and HIP (Hot Isostatic Pressing) technologies ensures superior metallurgical bonds for backed targets.
3
Scale & Customization: Ability to produce massive 300mm planar targets and rotary (cylindrical) targets tailored to specific OEM tool architectures.
4
Rigorous Quality Control: Adoption of CMM size testing, GDMS (Glow Discharge Mass Spectrometry), and ultrasonic flaw detection to ensure 100% reliability.
SCA Factory

About Shanghai Creative Advanced Materials

Established in the Shanghai Industrial Comprehensive Development Zone, we are a high-tech company integrating R&D, production, and sales. With 19 years of experience, we specialize in semiconductor ceramic targets, powder metallurgy targets, and advanced ceramic components.

Our commitment to "Top Quality" and "Fast Delivery" has made us a trusted partner for global brands requiring innovative, ready-to-run solutions. We provide full record traceability from raw materials to final products, with serial numbers for every single unit.

19+

Years of Experience

100+

Core Technologies

200+

Professionals

5000+

Satisfied Customers

Future Trends in the Cr Sputtering Target Industry

The industry is moving toward ultra-large format targets and alloyed solutions. Chromium combined with Silicon (CrSi) or Molybdenum (CrMo) is gaining traction in touch-panel displays and micro-LED applications to balance conductivity and corrosion resistance. Furthermore, the push for "Green Manufacturing" is forcing suppliers to adopt more efficient recycling programs for spent targets, a field where China is leading through innovative hydrometallurgical processes.

Macro Solutions for Global Procurement

🌐 Semiconductor Solutions

Supplying 300mm W, WTi, and Cr targets with sub-ppm impurity levels for logic and memory fab lines.

🚗 Automotive & Hard Coating

Custom MoTi and Cr targets designed for PVD coating of engine components to reduce friction and wear.

🔋 Energy & Solar

High-efficiency SiC and CrSi materials for next-generation power electronics and thin-film PV cells.

Comprehensive Product Series

Ceramic Components

  • Silicon Carbide Nozzles
  • Boron Carbide Armor Plates
  • Alumina Precision Parts
  • Boron Nitride Crucibles

Powder Metallurgy Targets

  • High-Purity Tungsten (W)
  • W-Ti Alloy Targets
  • High-Purity 300mm Cr Targets
  • Molybdenum Sputtering Targets

Advanced Powders

  • Premium SiC Powder
  • High-Purity B4C Powder
  • Ti3O5 Slugs
  • Si Al Slugs

Precision Production Flow Control

Raw Materials 01 Raw Materials

Control purity, particle size, and chemical stability.

Spray Granulation 02 Spray Granulation

Monitoring slurry concentration and particle distribution.

Cold Pressing 03 Cold Pressing

Automated forming for strength and consistency.

Sintering 04 Sintering

Hot pressing, pressureless, and reaction sintering methods.

Machining 05 Machining

Imported high-precision equipment for dimensional accuracy.

Testing 06 Testing

CMM, ceramic performance, and GDMS testing.

Cleaning 07 Cleaning & Packaging

Dust-free workshop and semiconductor cleaning lines.

Logistics 08 Logistics

Global export qualifications and reliable logistics partners.

Frequently Asked Questions (FAQ)

🔹 What is the typical purity of a Chromium sputtering target?

Standard industrial grade is 99.95%, but for semiconductor and high-end electronics, we provide 99.99% and 99.995% purity to minimize leakage current in thin films.

🔹 How does grain size affect the sputtering process?

Smaller, uniform grain size (<100μm) leads to a more uniform erosion profile, less particle flaking, and a more consistent deposition rate across the substrate.

🔹 Can you provide backed targets (bonding service)?

Yes, we offer Indium bonding to Oxygen-Free Copper (OFC) backing plates to improve thermal conductivity and mechanical strength during high-power sputtering.

🔹 What are the lead times for custom Cr targets from China?

Standard sizes are often in stock. Custom geometries or ultra-high purity orders typically take 3-5 weeks, including rigorous quality certification.

Industry Insights & Blog

Zirconia news
2026-07-02

China’s Independent Zirconia Upgrades

Localized sintering technologies drive upgraded zirconia ceramic industry in China.

Sintering news
2026-06-03

Deep Cultivation in Sintering

Advancing hot-pressing techniques for superior target density.

Pressureless sintering
2026-05-22

Advantages of Pressureless Sintering

Efficiency and scaling in advanced ceramic production.