Engineered through advanced powder metallurgy to ensure ultra-high density, sub-micron grain size, and outstanding sputtering performance.
Designed specifically for sub-28nm UK silicon foundry architectures. Excellent thermal stability and minimized particle emission during continuous magnetron sputtering deposition.
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Perfectly homogeneous titanium distributions designed for microelectronics barrier layers. Engineered via hot isostatic pressing (HIP) to meet defense and commercial grade parameters.
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High purity silicide phase controls with exceptionally low trace alkali metal concentration. Perfect for gate metallization applications in high-frequency radar modules.
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Manufactured using specialized powder metallurgy techniques to eliminate gas voids and improve deposition uniformity for wear-resistant aerospace tool applications.
View DetailsThe United Kingdom remains at the forefront of global technological innovation, driven by high-value sectors such as compound semiconductors (the CSconnected cluster in South Wales), aerospace engineering in the Midlands, automotive research in the Motorsport Valley, and advanced R&D divisions in Oxford, Cambridge, and London. Within these high-intensity ecosystems, the requirement for precision thin-film coatings has surged exponentially.
Modern magnetron sputtering systems utilized across UK R&D facilities and high-volume manufacturing lines necessitate high-performance powder metallurgy (PM) targets. As film thickness controls approach the atomic scale, target homogeneity, oxygen levels, and microstructural phase configurations directly determine product yields.
Shanghai Creative Advanced Materials Co., Ltd. (SCA) partners directly with British precision engineers and industrial manufacturers to bridge the gap between high-end powder preparation and local application-specific deployment, delivering targets with high relative density and controlled grain orientation.
A look into how we achieve >99% theoretical density and ultra-fine grain structures for highly uniform deposition.
We source metal and alloy powders with verified chemical purities from 99.9% to 99.999%. Continuous monitoring of particle size distribution prevents segregation during mixing.
Advanced slurry formulation paired with high-temperature spray dryers creates micro-spherical powder granules with perfect flowability and uniform fill density.
Utilizing high-pressure hydraulic setups, green compacts are pressed uniformly in all directions, avoiding density gradients and post-sintering deformations.
Integrating Vacuum Hot Pressing (VHP) and Hot Isostatic Pressing (HIP) technologies to consolidate the targets under strictly monitored atmospheres.
Why Density & Grain Structure Matter: In typical DC or RF magnetron sputtering, targets with internal micro-voids suffer from localized heating and thermal stresses. This creates micro-arcs, which lead to particulates flaking onto the substrate. SCA's powder metallurgy processes produce a micro-crystalline phase without structural voids, resulting in smooth sputtering, low particle generation, and extended target lifespans.
| Target Composition | Available Purity | Density (% of Theoretical) | Grain Size (Average) | Primary UK Applications |
|---|---|---|---|---|
| Tungsten (W) | 99.99% - 99.999% | ≥ 99.2% | < 100 μm | Semiconductor gate metal and contact layers |
| Tungsten-Titanium (WTi 90/10 wt%) | 99.99% | ≥ 98.5% | < 80 μm | Diffusion barrier layer in microelectronics |
| Tungsten Silicide (WSi) | 99.95% - 99.99% | ≥ 99.0% | < 50 μm | High-temperature gate electrodes & interconnections |
| Chromium (Cr) | 99.9% - 99.95% | ≥ 99.0% | < 120 μm | Tribological coatings, glass coatings & hard tooling |
| Silicon Carbide (SiC) | 99.9% - 99.99% | ≥ 99.5% | Sub-micron phase | Optical coatings, semiconductor structural parts |
Providing seamless integration of high-end Chinese manufacturing processes with demanding British engineering specifications.
Whether processing silicon or compound semiconductors (GaN, SiC) in regions like Bristol or Newport, our ultra-high purity targets guarantee reliable Schottky and ohmic contact barriers, meeting strict contamination controls.
British aerospace engine manufacturers utilize chromium and complex boride coatings to endure severe mechanical friction and thermal oxidation. SCA's chromium targets ensure excellent thickness uniformity and density profiles.
We comply fully with RoHS directives and maintain comprehensive testing processes. Our export pathways conform to post-Brexit customs procedures, ensuring reliable delivery direct to your facilities.
In an era of supply chain fluctuations, Shanghai Creative Advanced Materials Co., Ltd. (SCA) ensures high-volume consistency. Located in the Shanghai Industrial Comprehensive Development Zone, our factory controls the complete production cycle, from raw chemical refining to final indium bonding.
With direct air cargo access through Shanghai Pudong and connections to London Heathrow, Manchester, and Birmingham airports, we offer lead times that compete directly with local European distributors.
Connect with SCA Logistics TeamProviding customizable material configurations to match different sputtering tools and system architectures.
Optimized for magnetic recording media and magneto-optical research applications. Delivers precise alloy ratios and high density.
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Extremely hard boron carbide targets developed for wear-resistant coatings. Maintains high mechanical and chemical integrity under intense thermal cycles.
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Developed for flat panel displays and thin-film solar coatings, guaranteeing low trace oxygen levels and uniform material transfer.
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Fully customizable resistor target thin-film material. Features excellent thermal stability and TCR control characteristics.
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Key material for barrier layers in touch panel sensors and thin-film photovoltaic coatings, featuring excellent adhesive characteristics.
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Engineered for oxidation barrier coatings. Combines fine grains with low porosity to ensure excellent film uniformity.
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High-purity ceramic dielectric targets, perfect for insulation layers in microelectronic and display applications.
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High density oxide targets optimized for manufacturing transparent conductive oxide films and gas sensor components.
View Product PageWe ensure that every target shipped to the UK is fully tested. Our inspection laboratory utilizes coordinate measuring machines (CMM) to verify physical dimensions, helium leak testing for backing plate bonds, and scanning electron microscopy (SEM) to check grain size distribution.
We provide full record traceability, from the initial powder batch to the final bonded target. Every target is marked with a unique serial number and includes a comprehensive Certificate of Analysis (COA) containing ICP-MS purity measurements.
Available Target Bonding Styles:
Answers to common technical, logistics, and compliance queries from our UK business clients.
Ready to specify your customized targets or request a technical consultation?
Contact Our Engineering Department